Global Extreme Ultraviolet Lithography (EUVL) Systems Market: Industry Analysis and Forecast (2019-2026) – By Light Source, Equipment, Application and Region.

Global Extreme Ultraviolet Lithography (EUVL) Systems Market was valued US$ XX Bn in 2019 and is expected to reach XX Bn by 2026, at a CAGR of 31.24 % during a forecast period. The report includes the analysis of impact of COVID-19 lock-down on the revenue of market leaders, followers, and disrupters. Since lock down was implemented differently in different regions and countries, impact of same is also different by regions and segments. The report has covered the current short term and long term impact on the market, same will help decision makers to prepare the outline for short term and long term strategies for companies by region.   To know about the Research Methodology:-Request Free Sample Report Extreme ultraviolet lithography is a process for assembling microprocessors. This technology consents storage of more information. Increasing adoption of miniaturization and sophistication of electronic circuit devices are expected to drive the growth in the global extreme ultraviolet lithography (EUVL) systems market. Furthermore, miniaturization of transistors and electronic circuits within microprocessors surges the density and power of these systems, which is expected to provide lucrative opportunity for the growth of global extreme ultraviolet lithography (EUVL) systems market. Increasing adoption of miniaturization and sophistication of electronic circuit devices are expected to drive the growth in the global extreme ultraviolet lithography (EUVL) systems market. Furthermore, miniaturization of transistors and electronic circuits within microprocessors surges the density and power of these systems, which is expected to provide lucrative opportunity for the growth of global extreme ultraviolet lithography (EUVL) systems market. On the other hand, extreme ultraviolet lithography (EUVL) systems is a complex technology, which requires all new step-and-scan systems for the production of semiconductors are expected to limit the growth of the global extreme ultraviolet lithography (EUVL) systems market. The Laser-produced plasmas segment is estimated to hold the dominant position in the global extreme ultraviolet lithography (EUVL) systems market. The segment offers benefits like short-pulse and high average power laser beam than other sources. The memory segment is expected to grow at a XX % rate of CAGR during the forecast period. The other optical lithography techniques are currently prevalent several limitations like storage space constraints, large size, and low data transmission speed. An introduction of extreme ultraviolet lithography systems has removed these limitations. An increase in the sale of electronic devices and a rise in the trend of internet of things (IoT), which require large space is expected to boost the growth in the global extreme ultraviolet lithography (EUVL) systems market. The Asia Pacific region is projected to be the leading region in the global extreme ultraviolet lithography (EUVL) systems market. The leading position in the market can be attributed to the presence of a large number of semiconductor key players in the region. The South Korea country is expected to hold a significant share of the extreme ultraviolet lithography market in the Asia Pacific owing to the high usage of semiconductor devices like memories in the country. The rapid explanation of the semiconductor industry is expected to drive the extreme ultraviolet lithography (EUVL) systems market in the region. The objective of the report is to present a comprehensive assessment of the market and contains thoughtful insights, facts, historical data, industry-validated market data and projections with a suitable set of assumptions and methodology. The report also helps in understanding dynamics, structure by analysing the market segments and, project the global extreme ultraviolet lithography (EUVL) systems Market. The report also provides a clear representation of competitive analysis of key players by product, price, financial position, product portfolio, growth strategies, and regional presence in the global extreme ultraviolet lithography (EUVL) systems Market. The report also provides PEST analysis, PORTER’s analysis, SWOT analysis to address the question of shareholders in arranging the efforts and investment in the near future to a particular market segment.

Scope of the Report for Global Extreme Ultraviolet Lithography (EUVL) Systems Market: Inquire before buying

Global Extreme Ultraviolet Lithography (EUVL) Systems Market, By Light Source

• Laser Produced Plasmas (LPP) • Vacuum Sparks • Gas Discharges

Global Extreme Ultraviolet Lithography (EUVL) Systems Market, By Equipment

• Light Source • Mirrors • Mask • Others

Global Extreme Ultraviolet Lithography (EUVL) Systems Market, By Application

• Memory • Integrated device manufacturers (IDM) • Foundry • Others

Global Extreme Ultraviolet Lithography (EUVL) Systems Market, By Region

• North America • Europe • Asia Pacific • Middle East & Africa • South America

Key players operating in Global Extreme Ultraviolet Lithography (EUVL) Systems Market

• ASML • Canon Inc. • SUSS Microtec AG • Taiwan Semiconductor Manufacturing Company Limited • Ultratech Inc. • Vistec Semiconductor Systems • Intel Corporation • Nikon Corporation • NuFlare Technology Inc. • Samsung Corporation • Toshiba • Toppan Printing • TSMC • Samsung • SK Hynix • NTT Advanced Technology • Zeiss International • Global Foundries

Global Extreme Ultraviolet Lithography (EUVL) Systems Market

1. Preface 1.1. Report Scope and Market Segmentation 1.2. Research Highlights 1.3. Research Objectives 2. Assumptions and Research Methodology 2.1. Report Assumptions 2.2. Abbreviations 2.3. Research Methodology 2.3.1. Secondary Research 2.3.1.1. Secondary data 2.3.1.2. Secondary Sources 2.3.2. Primary Research 2.3.2.1. Data from Primary Sources 2.3.2.2. Breakdown of Primary Sources 3. Executive Summary: Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size, by Market Value (US$ Bn) 4. Market Overview 4.1. Introduction 4.2. Market Indicator 4.2.1. Drivers 4.2.2. Restraints 4.2.3. Opportunities 4.2.4. Challenges 4.3. Porter’s Analysis 4.4. Value Chain Analysis 4.5. Market Risk Analysis 4.6. SWOT Analysis 4.7. Industry Trends and Emerging Technologies 5. Supply Side and Demand Side Indicators 6. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis and Forecast 6.1. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size & Y-o-Y Growth Analysis 6.1.1. North America 6.1.2. Europe 6.1.3. Asia Pacific 6.1.4. Middle East & Africa 6.1.5. South America 7. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis and Forecast, by Light Source 7.1. Introduction and Definition 7.2. Key Findings 7.3. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 7.4. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size (US$ Bn) Forecast, by Light Source 7.5. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Light Source 7.6. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis, by Light Source 8. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis and Forecast, by Application 8.1. Introduction and Definition 8.2. Key Findings 8.3. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 8.4. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size (US$ Bn) Forecast, by Application 8.5. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Application 8.6. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis, by Application 9. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis and Forecast, by Equipment 9.1. Introduction and Definition 9.2. Key Findings 9.3. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 9.4. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size (US$ Bn) Forecast, by Equipment 9.5. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Equipment 9.6. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis, by Equipment 10. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Region 10.1. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Region 10.2. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size (US$ Bn) Forecast, by Region 10.3. Global Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis, by Region 11. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis 11.1. Key Findings 11.2. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 11.3. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 11.4. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 11.4.1. Laser Produced Plasmas (LPP) 11.4.2. Vacuum Sparks 11.4.3. Gas Discharges 11.5. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 11.6. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 11.6.1. Memory 11.6.2. Integrated device manufacturers (IDM) 11.6.3. Foundry 11.6.4. Others 11.7. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 11.8. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 11.8.1. Light Source 11.8.2. Mirrors 11.8.3. Mask 11.8.4. Others 11.9. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Country 11.10. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Country 11.10.1. U.S. 11.10.2. Canada 11.11. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Country 11.12. U.S. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 11.12.1. Laser Produced Plasmas (LPP) 11.12.2. Vacuum Sparks 11.12.3. Gas Discharges 11.13. U.S. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 11.13.1. Memory 11.13.2. Integrated device manufacturers (IDM) 11.13.3. Foundry 11.13.4. Others 11.14. U.S. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 11.14.1. Light Source 11.14.2. Mirrors 11.14.3. Mask 11.14.4. Others 11.15. Canada Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 11.15.1. Laser Produced Plasmas (LPP) 11.15.2. Vacuum Sparks 11.15.3. Gas Discharges 11.16. Canada Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 11.16.1. Memory 11.16.2. Integrated device manufacturers (IDM) 11.16.3. Foundry 11.16.4. Others 11.17. Canada Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 11.17.1. Light Source 11.17.2. Mirrors 11.17.3. Mask 11.17.4. Others 11.18. North America Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis 11.18.1. By Light Source 11.18.2. By Application 11.18.3. By Equipment 11.19. PEST Analysis 11.20. Key Trends 11.21. Key Developments 12. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis 12.1. Key Findings 12.2. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 12.3. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 12.4. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.4.1. Laser Produced Plasmas (LPP) 12.4.2. Vacuum Sparks 12.4.3. Gas Discharges 12.5. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 12.6. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.6.1. Memory 12.6.2. Integrated device manufacturers (IDM) 12.6.3. Foundry 12.6.4. Others 12.7. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 12.8. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.8.1. Light Source 12.8.2. Mirrors 12.8.3. Mask 12.8.4. Others 12.9. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Country 12.10. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Country 12.10.1. Germany 12.10.2. U.K. 12.10.3. France 12.10.4. Italy 12.10.5. Spain 12.10.6. Rest of Europe 12.11. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Country 12.12. Germany Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.12.1. Laser Produced Plasmas (LPP) 12.12.2. Vacuum Sparks 12.12.3. Gas Discharges 12.13. Germany Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.13.1. Memory 12.13.2. Integrated device manufacturers (IDM) 12.13.3. Foundry 12.13.4. Others 12.14. Germany Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.14.1. Light Source 12.14.2. Mirrors 12.14.3. Mask 12.14.4. Others 12.15. U.K. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.15.1. Laser Produced Plasmas (LPP) 12.15.2. Vacuum Sparks 12.15.3. Gas Discharges 12.16. U.K. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.16.1. Memory 12.16.2. Integrated device manufacturers (IDM) 12.16.3. Foundry 12.16.4. Others 12.17. U.K. Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.17.1. Light Source 12.17.2. Mirrors 12.17.3. Mask 12.17.4. Others 12.18. France Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.18.1. Laser Produced Plasmas (LPP) 12.18.2. Vacuum Sparks 12.18.3. Gas Discharges 12.19. France Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.19.1. Memory 12.19.2. Integrated device manufacturers (IDM) 12.19.3. Foundry 12.19.4. Others 12.20. France Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.20.1. Light Source 12.20.2. Mirrors 12.20.3. Mask 12.20.4. Others 12.21. Italy Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.21.1. Laser Produced Plasmas (LPP) 12.21.2. Vacuum Sparks 12.21.3. Gas Discharges 12.22. Italy Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.22.1. Memory 12.22.2. Integrated device manufacturers (IDM) 12.22.3. Foundry 12.22.4. Others 12.23. Italy Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.23.1. Light Source 12.23.2. Mirrors 12.23.3. Mask 12.23.4. Others 12.24. Spain Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.24.1. Laser Produced Plasmas (LPP) 12.24.2. Vacuum Sparks 12.24.3. Gas Discharges 12.25. Spain Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.25.1. Memory 12.25.2. Integrated device manufacturers (IDM) 12.25.3. Foundry 12.25.4. Others 12.26. Spain Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.26.1. Light Source 12.26.2. Mirrors 12.26.3. Mask 12.26.4. Others 12.27. Rest of Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 12.27.1. Laser Produced Plasmas (LPP) 12.27.2. Vacuum Sparks 12.27.3. Gas Discharges 12.28. Rest of Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 12.28.1. Memory 12.28.2. Integrated device manufacturers (IDM) 12.28.3. Foundry 12.28.4. Others 12.29. Rest Of Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 12.29.1. Light Source 12.29.2. Mirrors 12.29.3. Mask 12.29.4. Others 12.30. Europe Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis 12.30.1. By Light Source 12.30.2. By Application 12.30.3. By Equipment 12.31. PEST Analysis 12.32. Key Trends 12.33. Key Developments
13. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis 13.1. Key Findings 13.2. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 13.3. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 13.4. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.4.1. Laser Produced Plasmas (LPP) 13.4.2. Vacuum Sparks 13.4.3. Gas Discharges 13.5. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 13.6. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.6.1. Memory 13.6.2. Integrated device manufacturers (IDM) 13.6.3. Foundry 13.6.4. Others 13.7. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 13.8. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.8.1. Light Source 13.8.2. Mirrors 13.8.3. Mask 13.8.4. Others 13.9. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Country 13.10. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Country 13.10.1. China 13.10.2. India 13.10.3. Japan 13.10.4. ASEAN 13.10.5. Rest of Asia Pacific 13.11. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Country 13.12. China Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.12.1. Laser Produced Plasmas (LPP) 13.12.2. Vacuum Sparks 13.12.3. Gas Discharges 13.13. China Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.13.1. Memory 13.13.2. Integrated device manufacturers (IDM) 13.13.3. Foundry 13.13.4. Others 13.14. China Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.14.1. Light Source 13.14.2. Mirrors 13.14.3. Mask 13.14.4. Others 13.15. India Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.15.1. Laser Produced Plasmas (LPP) 13.15.2. Vacuum Sparks 13.15.3. Gas Discharges 13.16. India Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.16.1. Memory 13.16.2. Integrated device manufacturers (IDM) 13.16.3. Foundry 13.16.4. Others 13.17. India Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.17.1. Light Source 13.17.2. Mirrors 13.17.3. Mask 13.17.4. Others 13.18. Japan Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.18.1. Laser Produced Plasmas (LPP) 13.18.2. Vacuum Sparks 13.18.3. Gas Discharges 13.19. Japan Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.19.1. Memory 13.19.2. Integrated device manufacturers (IDM) 13.19.3. Foundry 13.19.4. Others 13.20. Japan Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.20.1. Light Source 13.20.2. Mirrors 13.20.3. Mask 13.20.4. Others 13.21. ASEAN Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.21.1. Laser Produced Plasmas (LPP) 13.21.2. Vacuum Sparks 13.21.3. Gas Discharges 13.22. ASEAN Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.22.1. Memory 13.22.2. Integrated device manufacturers (IDM) 13.22.3. Foundry 13.22.4. Others 13.23. ASEAN Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.23.1. Light Source 13.23.2. Mirrors 13.23.3. Mask 13.23.4. Others 13.24. Rest of Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 13.24.1. Laser Produced Plasmas (LPP) 13.24.2. Vacuum Sparks 13.24.3. Gas Discharges 13.25. Rest of Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 13.25.1. Memory 13.25.2. Integrated device manufacturers (IDM) 13.25.3. Foundry 13.25.4. Others 13.26. Rest of Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 13.26.1. Light Source 13.26.2. Mirrors 13.26.3. Mask 13.26.4. Others 13.27. Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis 13.27.1. By Light Source 13.27.2. By Application 13.27.3. By Equipment 13.28. PEST Analysis 13.29. Key Trends 13.30. Key Developments
14. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis 14.1. Key Findings 14.2. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 14.3. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 14.4. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 14.4.1. Laser Produced Plasmas (LPP) 14.4.2. Vacuum Sparks 14.4.3. Gas Discharges 14.5. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 14.6. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 14.6.1. Memory 14.6.2. Integrated device manufacturers (IDM) 14.6.3. Foundry 14.6.4. Others 14.7. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 14.8. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 14.8.1. Light Source 14.8.2. Mirrors 14.8.3. Mask 14.8.4. Others 14.9. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Country 14.10. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Country 14.10.1. GCC 14.10.2. South Africa 14.10.3. Rest of Middle East & Africa 14.11. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Country 14.12. GCC Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 14.12.1. Laser Produced Plasmas (LPP) 14.12.2. Vacuum Sparks 14.12.3. Gas Discharges 14.13. GCC Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 14.13.1. Memory 14.13.2. Integrated device manufacturers (IDM) 14.13.3. Foundry 14.13.4. Others 14.14. GCC Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 14.14.1. Light Source 14.14.2. Mirrors 14.14.3. Mask 14.14.4. Others 14.15. South Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 14.15.1. Laser Produced Plasmas (LPP) 14.15.2. Vacuum Sparks 14.15.3. Gas Discharges 14.16. South Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 14.16.1. Memory 14.16.2. Integrated device manufacturers (IDM) 14.16.3. Foundry 14.16.4. Others 14.17. South Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 14.17.1. Light Source 14.17.2. Mirrors 14.17.3. Mask 14.17.4. Others 14.18. Rest of Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 14.18.1. Laser Produced Plasmas (LPP) 14.18.2. Vacuum Sparks 14.18.3. Gas Discharges 14.19. Rest of Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 14.19.1. Memory 14.19.2. Integrated device manufacturers (IDM) 14.19.3. Foundry 14.19.4. Others 14.20. Rest of Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 14.20.1. Light Source 14.20.2. Mirrors 14.20.3. Mask 14.20.4. Others 14.21. Middle East & Africa Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis 14.21.1. By Light Source 14.21.2. By Application 14.21.3. By Equipment 14.22. PEST Analysis 14.23. Key Trends 14.24. Key Developments 15. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis 15.1. Key Findings 15.2. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 15.3. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Light Source 15.4. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 15.4.1. Laser Produced Plasmas (LPP) 15.4.2. Vacuum Sparks 15.4.3. Gas Discharges 15.5. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Application 15.6. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 15.6.1. Memory 15.6.2. Integrated device manufacturers (IDM) 15.6.3. Foundry 15.6.4. Others 15.7. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Equipment 15.8. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 15.8.1. Light Source 15.8.2. Mirrors 15.8.3. Mask 15.8.4. Others 15.9. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Value Share Analysis, by Country 15.10. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Country 15.10.1. Brazil 15.10.2. Mexico 15.10.3. Rest of South America 15.11. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Analysis, by Country 15.12. Brazil Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 15.12.1. Laser Produced Plasmas (LPP) 15.12.2. Vacuum Sparks 15.12.3. Gas Discharges 15.13. Brazil Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 15.13.1. Memory 15.13.2. Integrated device manufacturers (IDM) 15.13.3. Foundry 15.13.4. Others 15.14. Brazil Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 15.14.1. Light Source 15.14.2. Mirrors 15.14.3. Mask 15.14.4. Others 15.15. Mexico Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 15.15.1. Laser Produced Plasmas (LPP) 15.15.2. Vacuum Sparks 15.15.3. Gas Discharges 15.16. Mexico Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 15.16.1. Memory 15.16.2. Integrated device manufacturers (IDM) 15.16.3. Foundry 15.16.4. Others 15.17. Mexico Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 15.17.1. Light Source 15.17.2. Mirrors 15.17.3. Mask 15.17.4. Others 15.18. Rest of South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Light Source 15.18.1. Laser Produced Plasmas (LPP) 15.18.2. Vacuum Sparks 15.18.3. Gas Discharges 15.19. Rest of South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Application 15.19.1. Memory 15.19.2. Integrated device manufacturers (IDM) 15.19.3. Foundry 15.19.4. Others 15.20. Rest of South America Extreme Ultraviolet Lithography (EUVL) Systems Market Forecast, by Equipment 15.20.1. Light Source 15.20.2. Mirrors 15.20.3. Mask 15.20.4. Others 15.21. South America Extreme Ultraviolet Lithography (EUVL) Systems Market Attractiveness Analysis 15.21.1. By Light Source 15.21.2. By Application 15.21.3. By Equipment 15.22. PEST Analysis 15.23. Key Trends 15.24. Key Developments 16. Company Profiles 16.1. Market Share Analysis, by Company 16.2. Competition Matrix 16.2.1. Competitive Benchmarking of key players by price, presence, market share, Applications and R&D investment 16.2.2. New Product Launches and Product Enhancements 16.2.3. Market Consolidation 16.2.3.1. M&A by Regions, Investment and Applications 16.2.3.2. M&A Key Players, Forward Integration and Backward Integration 16.3. Company Profiles: Key Players 16.3.1. 3M Company 16.3.1.1. Company Overview 16.3.1.2. Financial Overview 16.3.1.3. Portfolio 16.3.1.4. Business Strategy 16.3.1.5. Recent Developments 16.3.1.6. Manufacturing Footprint 16.3.2. Tezzaron Semiconductor Corporation 16.3.3. SAMSUNG 16.3.4. Taiwan Semiconductor Manufacturing Company, Ltd. 16.3.5. Xilinx 16.3.6. United Microelectronics Corporation 16.3.7. STMicroelectronics 16.3.8. MonolithIC 3D Inc. 16.3.9. Intel 16.3.10. Micron 16.3.11. SanDisk 16.3.12. SK Hynix 16.3.13. STATS ChipPAC 16.3.14. Zeiss International 16.3.15. Global Foundries 17. Primary Key Insights

About This Report

Report ID34030
Category Electronics
Published DateSept 2019
Updated DateSep 2020
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